Regensburg 2013 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 7: Ion Beam Methods

MI 7.1: Vortrag

Mittwoch, 13. März 2013, 11:00–11:30, H5

The He Ion Microscope: Extending the frontiers of nanoscale research — •Peter Gnauck — Carl Zeiss Microscopy, Oberkochen, Germany

The need for more precise image information of samples coming from fields such as materials analysis, semiconductor processing, and life sciences have pushed the boundaries of charged particle microscopy. A new microscope has been developed that uses a beam of helium ions which is focused and scanned across the sample. In principle, and in its applications, it is similar to a traditional scanning electron microscope (SEM). However, the source technology, the sample interaction, and the contrast mechanisms are distinctly different. The helium ion source offers high brightness and a small energy spread, and hence allows the beam to be focused into very small probe sizes. As the helium ion microscope uses heavier Helium ions instead of electrons the helium ion microscope overcomes the diffraction effect that limits the resolution of a classical SEM. As the beam interacts with the sample, the beam penetrates relatively deeply before it diverges and hence there is a narrow sample interaction region near the surface. This results in an unmatched surface sensitive imaging capability. The helium beam generates secondary electrons, scattered helium atoms (ions and neutrals), and other detectable particles from which images can be generated or analysis can be performed. Due to the different beam * sample interaction of the He ions compared to electrons the HIM provides unmatched surface sensitivity even at high voltages.