Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
MM: Fachverband Metall- und Materialphysik
MM 11: Topical Session: TEM-Symposium - STEM
MM 11.2: Vortrag
Montag, 11. März 2013, 16:15–16:30, H4
High Precision STEM Imaging by Non-Rigid Alignment and Averaging of a Series of Short Exposures — •Paul Voyles1,2,3, Andrew Yankovich1, Benjamin Berkels4, Peter Binev4, and Wolfgang Dahmen3 — 1University of Wisconsin, Madison, United States — 2Forschungszentrum Jülich, Jülich — 3RWTH Aachen, Aachen — 4University of South Carolina, Columbia, South Carolina, United States
We have developed a method for non-rigid registration of a series of Z-contrast scanning transmission electron microscopy (STEM) images. The registered series can be averaged to improve signal to noise without loss of resolution. At very high dose to the sample, 105 C/cm2, lattice images with reproducible precision in the atomic column positions better than 1 pm can be obtained. At an order of magnitude lower dose, images with 2-3 pm precision can be obtained. Lower dose images have been used to measure the displacements of atoms at the edges and corners of Pt on γ-Al2O3 nanocatalysts. Edge atoms experience displacements of 10-20 pm, consistent with previous reports. Corner atom displacements are 30-50 pm.