Regensburg 2013 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 15: Poster Session
MM 15.50: Poster
Montag, 11. März 2013, 18:00–20:00, Poster E
Large-area structuring of nanorod arrays by laser interference lithography — •Eric Jehnes1, Vera Hoffmann1, René Kullock2, Gunther Scheunert3, and Lukas M. Eng1 — 1Department of Applied Photophysics, TU Dresden, Germany — 2Department of Experimental Physics 5, University of Würzburg, Germany — 3Department of Physics and Astronomy, Queen’s University, Belfast, UK
Metal nanorod arrays grown in anodic aluminum oxide show distinct plasmonic resonances, which can be tuned via the rod length, diameter and spacing of the rods [1,2]. However, the influence of structuring (e.g. parallel lines of rods) on the plasmonic properties has not yet been investigated. The work we present concerns the preparation of such structured arrays. To arrange the rods, laser interference lithography is used. This method is able to deliver high-quality periodic photoresist patterns with low defect densities over an area of several cm2. To integrate the structuring process into the nanorod fabrication, lithography is combined with wet etching and physical vapor deposition. The resulting structures are expected to show new optical properties that can be used to increase the tunability of the plasmonic resonances. Hence, structured arrays find applications in optical waveguides and sensors both for the visible and near infrared range. Furthermore, our technique provides the basis for the low-cost integration of optoelectronic and storage devices based on such nanorod arrays.
[1] R. Kullock et al., Optics Express 16, 21671 (2008) [2] R. Kullock et al., J. Opt. Soc. Am. B 27, 1819 (2010)