Regensburg 2013 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 15: Poster Session

MM 15.82: Poster

Montag, 11. März 2013, 18:00–20:00, Poster E

Reduction of Radiation Damage in Ultrathin MoS₂ — •Mona Sedighi, Simon Kurasch, Gerardo Algara-Siller, and Ute Kaiser — Central Facility for Electron Microscopy, Group of Electron Microscopy of Materials Science, University of Ulm, 89081 Ulm, Germany

Previous high-resolution transmission electron microscopy (HRTEM) experiments [1] on free-standing single layer MoS₂ reported that, at an acceleration voltage of 80 kV, the material suffers from knock-on damage via removal of sulfur atoms from the beam exit surface. Similar to earlier work on graphene [2] it is possible to extract the sputtering cross section from atomically resolved HRTEM time series.

Here we report that, covering the electron exit surface of the free-standing single-layer MoS₂ by single-layer graphene serves to minimize the radiation damage. Moreover, comparing the response to high electron irradiation of free-standing MoS₂ to top-side covered and bottom-side covered MoS₂ allows separating the effect of ionization and chemical damage from the total damage that initially was attributed only to sputtering.

[1] H. Komsa et al., Phys. Rev. Lett 109, 035503 (2012)

[2] J. Meyer et al., Phys. Rev. Lett 108, 196102 (2012)