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MM: Fachverband Metall- und Materialphysik

MM 19: Topical Session: Combinatorial Materials Science I

MM 19.1: Topical Talk

Dienstag, 12. März 2013, 10:15–10:45, H25

Development of new materials using high-throughput thin film experimentation and up-scaling — •Alfred Ludwig — Ruhr-Universität Bochum, Germany

New or optimized multifunctional materials are needed, e.g. for miniaturization of technological products with improved functionality even in extreme conditions or for efficient production/storage/conversion of energy carriers. For the discovery and optimization of new materials combinatorial and high-throughput experimentation methods are very effective. The materials to be investigated are deposited in the form of materials libraries by special magnetron sputter deposition methods (co-deposition, wedge-type multilayer deposition, shadow masking). These materials libraries are subsequently processed and characterized by high-throughput experimentation methods (automated EDX, XRD, temperature-dependent resistance and stress screening) in order to relate compositional information with structural and functional properties. The talk will cover examples of the combinatorial development of intermetallic materials for shape memory (Ni-Ti-X-Y, Fe-Pd-X) applications as well as new materials for solar water splitting. The obtained results are visualized in the form of composition-function diagrams. Examples of up-scaling from thin film findings to bulk applications are discussed.