Regensburg 2013 – scientific programme
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O: Fachverband Oberflächenphysik
O 22: Nanostructures at Surfaces II
O 22.4: Talk
Monday, March 11, 2013, 16:45–17:00, H45
Stitch-free Electron Beam Lithography of Bragg Gratings and Photonic Crystals — Michael Kahl1, •Jörg Stodolka1, and Kevin Burcham2 — 1Raith GmbH, Konrad-Adenauer-Allee 8, Dortmund, 44263, Germany — 2Raith USA, Inc., 2805 Veterans Highway, Suite 23, Ronkonkoma, NY 11779
We report on a new exposure mode for eliminating stitching errors and increasing the throughput in vector scan electron and ion beam lithography (EBL/IBL) of large-area, periodic micro and nano structures. When using the modulated beam moving stage (MBMS) exposure mode, beam movement is controlled in a way that the combination of patterning and continuous movement of a laser interferometer stage results in stitch-free, strip-shaped periodic structures.
The new mode has been used to expose 50 microns wide and 1 mm long gratings with a pitch within a 0.1nm tolerance for the target pitch across the complete grating, demonstrating that MBMS can fabricate periodic structures with virtually no stitching errors in the direction of stage motion. Furthermore, MBMS significantly increases throughput by reducing the times associated with stage motion, pattern data preparation and transfer, and beam settling times. Moreover, 2D arrays of circles or of any other patterns can be written with corresponding complex beam patterns, both as strip-shaped and area structures. The DFB laser gratings and photonic crystals presented in this report are just the first application examples, indicating the potential of MBMS for writing periodic structures for multiple applications such as plasmonic structures in sensors and nano sieves.