Regensburg 2013 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 36: Poster Session II (Organic films and electronics, photoorganics; Nanostructures; Plasmonics and nanooptics, Surface chemical reactions and heterogeneous catalysis, Surface dynamics )

O 36.24: Poster

Dienstag, 12. März 2013, 18:15–21:45, Poster B2

Fabrication of plasmonic gold nanostructures for SERS using electron beam lithography and shadow evaporation — •Mario Fey — Justus-Liebig-Universität, Gießen, Deutschland

Plasmonic nanostructures exhibit a high local electric field and thus can be used for enhancing Raman signals. In order to fabricate such structures a combination of electron beam lithography (EBL) with a bilayer resist (PMMA on top of a copolymer) and shadow evaporation is used. Shadow evaporation is a means of overcoming the limitation of EBL by proximity effects and allows one to obtain metal structures with intermediate gaps of a few nanometers. A bilayer resist exhibits a pronounced T-bone undercut due to the different sensitivities of PMMA and the copolymer. The undercut allows one to carry out evaporation from different angles so the gap between two nanostructures can be tuned by the evaporation angle. The metallic line and dot structures with gaps of few nanometers were coated with dye solutions and studied by Raman spectroscopy to reveal plasmonic field enhancement in the Raman process.