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Regensburg 2013 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 36: Poster Session II (Organic films and electronics, photoorganics; Nanostructures; Plasmonics and nanooptics, Surface chemical reactions and heterogeneous catalysis, Surface dynamics )

O 36.49: Poster

Dienstag, 12. März 2013, 18:15–21:45, Poster B2

Fabrication of nanoscaled plasmonic structures for Photoelectron emission microscopy (PEEM) by electron beam lithography — •Christian Späth, Anika Spreen, Soo Hoon Chew, Kellie Pearce, and Ulf Kleineberg — Ludwig-Maximilians-Universität München, Department für Experimentalphysik und Laserphysik, Coulombwall 1, 85748 Garching

To support experiments in the field of ultrafast nano-optics and plasmonics the fabrication of metallic nanostructures of various sizes and shapes by electron beam lithography is an important prerequisite.

We report on our latest results in the development process of nanoantennas for local optical field enhancement by localized surface plasmons (LSP) and tapered plasmonic waveguides for transportation and possible control of surface plasmon polaritons (SPP). Waveguides with different geometries with respect to size, tip shape, incoupling grating periods have been written in PMMA bilayer resist systems on Si (100) wafer and have subsequently been metal coated with ultrathin Ag or Au layers and finalized by lift-off; similarly with all nanoantennas, e.g. bow ties, ellipsoids and gratings in different sizes and arrangements.

The topography of these structures has been analyzed by means of atomic force and scanning electron microscopy and the spatiotemporal plasmonic properties of the nanosamples have been investigated by nonlinear laser photoelectron emission microscopy. Furthermore we plan to utilize different substrate materials such as diamond like carbon (DLC) or indium zinc oxide (InZnO) to improve image contrast during PEEM experiments.

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