Regensburg 2013 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 36: Poster Session II (Organic films and electronics, photoorganics; Nanostructures; Plasmonics and nanooptics, Surface chemical reactions and heterogeneous catalysis, Surface dynamics )

O 36.62: Poster

Dienstag, 12. März 2013, 18:15–21:45, Poster B2

Irradiation of graphene on calcium fluoride with highly charged ions — •Philipp Ernst, Jakob Krämer, Roland Kozubek, Johannes Hopster, and Marika Schleberger — Fakultät für Physik, Universität Duisburg-Essen, 47048 Duisburg, Germany

We have irradiated CaF₂ and graphene on CaF₂ with slow (E_kin=260 keV) highly charged ions (¹²⁹Xe³⁵⁺), which leads to defects on the surface in the nm-range. The topography of the sample is analyzed using an atomic force microscope (AFM) in contact- and tapping-mode. Two different types of masks were designed to compare irradiated areas on CaF₂ with unirradiated areas. Thus, it is possible to distinguish between small clusters most likely due to sputtering and defects directly created by HCI impact. We show, that AFM operating parameters have to be carefully chosen to perform a quantitative analysis of irradiation induced defects. The uncovered CaF₂ surface shows the well known hillocks induced by individual HCI impacts. The defects on graphene appear as regions of increased friction. By flipping the graphene flake with the AFM tip, the CaF₂ substrate below could be studied. There, the diameter of the hillocks are significantly smaller (7-8 nm) than on the uncovered sections of CaF₂ (15-40 nm).