Regensburg 2013 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 36: Poster Session II (Organic films and electronics, photoorganics; Nanostructures; Plasmonics and nanooptics, Surface chemical reactions and heterogeneous catalysis, Surface dynamics )
O 36.74: Poster
Dienstag, 12. März 2013, 18:15–21:45, Poster B2
High deposition rate of metal (oxide) nanoclusters generated in pulsed DC magnetron sputtering system — •Oleksandr Polonskyi1,2, Tilo Peter1, Amir Ahadi1, Alexander Hinz1, Thomas Strunskus1, Vladimir Zaporojtchenko1,3, and Hynek Biederman2 — 1Faculty of Engineering, Institute for Materials Science - Multicomponent Materials, Kiel University, Kaiserstr. 2, D-24143 Kiel, Germany — 2Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Prague 8, Czech Republic — 3deceased
The effect of pulsing a DC magnetron discharge on deposition of metal (-oxide) nanoclusters was studied. The work is focused mainly on the deposition of Ti (TiOx) nanoclusters by means of gas aggregation cluster source based on magnetron sputtering. Argon was used as a working gas and additionally, a low concentration of oxygen was admixed, which is necessary for the cluster formation process. The discharge was excited using the combination of a DC power supply operating at constant power mode and self-constructed pulsing unit with frequency repetition up to 100 kHz. It was found that the utilization of pulsed magnetron sputtering provides an extremely high deposition rate of Ti (TiOx) nanoclusters in comparison to a continuous magnetron discharge. The influence of the discharge repetition frequency (20-100 kHz) and duty cycle (20-90%) was investigated. By adjusting the duty cycle and repetition frequency at constant power and oxygen admixture, a maximum efficiency of cluster generation and thus deposition rate can be found.