Regensburg 2013 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 43: Plasmonics and Nanooptics IV
O 43.1: Vortrag
Mittwoch, 13. März 2013, 10:30–10:45, H31
Repetitive hole-mask colloidal lithography for large-area multi-shape plasmonic nanostructures — •Jun Zhao1, Sarah Jaber2, Paul Mulvaney2, and Harald Giessen1 — 14th Physics Institute and Research Center SCoPE, University of Stuttgart, Germany — 2School of Chemistry and Bio21 Institute, University of Melbourne, Australia
We fabricate large-area (cm2 size) plasmonic nanostructures of multiple shapes, orientations, and sizes. We utilize repetitive hole-mask colloidal lithography with sparsely distributed polystyrene beads. Multiple lithography leads to neat structures with high area coverage and very little nanostructure touching or overlap. The optical spectra of our sample show well modulated resonances, which confirm the high quality of our fabrication method. Our method is useful to create polarization-independent split-ring arrays, broadband multi-peak infrared antennas for SEIRA enhancement[1], nanostructures with simultaneous SERS and SEIRA enhancement in the visible and IR, as well as chiral 3D plasmonic structures with C3 or C4 symmetry.
[1] S. Cataldo, J. Zhao, F. Neubrech, B. Frank, C. Zhang, P. V. Braun, H. Giessen, ACS Nano 2012, 6, 979.