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O: Fachverband Oberflächenphysik

O 53: Scanning Probe Methods II

O 53.9: Vortrag

Mittwoch, 13. März 2013, 18:00–18:15, H31

Utilizing dynamic work function measurements to distinguish adsorbates on Si(100) — •Ferdinand Huber, Alfred J. Weymouth, and Franz. J. Giessibl — Institute for Experimental and Applied Physics, University of Regensburg, 93040 Regensburg, Germany

It has been proposed that STM with an oscillating tip can be used to measure the work function locally [1, 2]. By combining this technique with STM and AFM measurements, taken in UHV at room temperature, we should be able to distinguish between deposited adatoms and surface defects [3]. Here, we deposit Mo on Si(100) and attempt to determine its atomic structure and true adsorption sites at low coverage as there are open questions [4].

[1] J. B. Pethica, J. Knall and J. H. Wilson, Inst. Phys. Conf. Ser. 134, 597 (1993)

[2] M. Herz, Ch. Schiller, F. Giessibl and J. Mannhart, Appl. Phys. Lett. 86, 153101 (2005)

[3] R. J. Hamers and U. K. Köhler, J. Vac. Sci. Technol. A 7, 2854 (1989)

[4] P. Bedrossian, Surface Science 320, 247 (1994)