Regensburg 2013 – scientific programme

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O: Fachverband Oberflächenphysik

O 84: Photovoltaics (jointly with CPP, DS and HL)

O 84.9: Talk

Friday, March 15, 2013, 11:15–11:30, H2

Simulation of temperature distribution in ZnO:Al thin films for laser annealing experiments — •Christian Isenberg, Cay-Christian Kalmbach, Daniyal Sattarian, Uwe Stute, and Alexander Horn — Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover, Germany

Transparent Conducting Oxides (TCOs) have become widespread as transparent electrodes in photovoltaics and transparent electronics. Thermal post deposition treatments by furnace annealing have shown to improve the electrical and optical properties of TCO thin films. Laser annealing of TCOs allows control over the peak temperature as well as the spatial and temporal temperature distributions of TCO thin films and substrates, preserving the substrate by heating only the TCO layer. Therefore, treating TCOs with tailored laser radiation allows larger temperature than furnace annealing even on temperature sensitive substrates. Numerical calculations using Crank-Nicolson method have been conducted to estimate the temperature distribution in ZnO:Al thin films during laser annealing process. In the special case of temperature-independent material parameters, the numerical solution is reduced to an analytical solution, determined by convolution of the heating source term with a Green's function for a geometry of a thin film on a semi-infinite substrate. Numerical results are compared to temperature measurements, done by a thermographic camera during laser annealing process.