Regensburg 2013 – wissenschaftliches Programm
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TT: Fachverband Tiefe Temperaturen
TT 40: Poster Session Correlated Electrons
TT 40.18: Poster
Mittwoch, 13. März 2013, 15:00–19:00, Poster D
Effect of hydrostatic pressure on Yb(Rh1−x Fex)2 Si2 — •Sebastian-Horst Hübner, Yoshi Tokiwa, Hirale S. Jeevan, Maik Schubert, and Philipp Gegenwart — I. Physik. Institut, Georg-August Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen
The temperature scale, T*(K), in undoped YbRh2 Si2 have gathered much attention due to its different interpretations. Substituting Fe on the Rh site in YbRh2 Si2 causes a combined effect of chemical pressure and hole doping. By increasing Fe-doping, both the Kondo temperature and Neél temperature TN ( = 70 mK for x=0) decrease, with a critical concentration of x∼0.08, which suppresses TN to zero. Since positive pressure enhances TN in Yb-based materials, the hole doping is most likely responsible for the supression. Along with the suppression of TN, T*(K) also decreases with Fe-doping and dissappears around the same critical concentration, x=0.08.
Application of hydrostatic pressure on Yb(Rh1−x Fex)2 Si2 with x>0.08 may cause a reappearance of antiferromagnetic order and it is highly interesting wheather or not the T*(K) scale also reappears. Here, we present resistivity of Yb(Rh1−x Fex)2 Si2 with x=0.105 under hydrostatic pressure and discuss our results in terms of the proposed interpretations.