Berlin 2014 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 18: Poster Session - Plasma Technology
P 18.2: Poster
Mittwoch, 19. März 2014, 16:30–18:30, SPA Foyer
Plasma etch requirements for technological preparation of sensor components for biochemical analysis — •Harald Richter1, David Stolarek1, Mirko Fraschke1, Steffen Marschmeyer1, Jürgen Drews1, Lars Zimmermann1,2, Matthias Jäger2, Jürgen Bruns2, and Bernd Tillack1,2 — 1IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) — 2Technische Universität Berlin, HFT4, Einsteinufer 25, 10587 Berlin
For more than ten years, there has been an increasing interest in development of integrated optical sensors based on high sensitivity in biochemical analysis and a relatively simply low-cost production process. The present work is focused on the development of a new sensor device consisting of a microring resonator array coupled to a single bus waveguide producing in a CMOS compatible technological process. Plasma etching is a key process step for realization of optical sensor components (microring resonators, rib waveguides, nanowires, coupling structures, heating structures for thermo-optical modulation). Different hard mask materials for several plasma etch processes were tested and optimized. Experiments have shown the mask opening step is significant for preparation of high-performance silicon sensor modules. For the final preparation step, the residue-free microring opening a combination of plasma etching and wet etching is preferred. Such prepared sensor components were used for multiplexed label-free detection of different biochemical compounds successfully.