Berlin 2014 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 21: Plasma Technology II

P 21.2: Hauptvortrag

Donnerstag, 20. März 2014, 11:00–11:30, SPA HS201

Plasma based deposition of nanoparticles and nanocomposites — •Thomas Strunskus — Institute of Materials Science - Multicomponent Materials, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel, Germany

Nanocomposites combine favorable features of the constituents on the nanoscale to obtain interesting new functionalities for e.g. optical, magnetic or medical applications [1]. The present talk is concerned with the plasma based deposition of metal and metal oxide nanoparticles and their combination with dielectric organic or inorganic matrices. Such nanocomposites can be created by magnetron co-sputtering of the matrix and metallic components. A more elegant way is the creation of nanoparticles prior to deposition by a magnetron sputtering process in a gas aggregation source and combination with a plasma or sputtering deposition process for the matrix. The processes occurring in the gas aggregation source under different operation conditions will be discussed. Computer simulations of the metal aggregation process in the gas phase and in the solid phase during growth will also be addressed.

[1] Metal-Polymer Nanocomposites for Functional Applications, F. Faupel, V. Zaporojtchenko, T. Strunskus, M. Elbahri, Adv. Engin. Mater. 12(12), (2010), 1177.

Financial support by the DFG within the Collaborative Research Center TR24 "Fundamentals of Complex Plasmas" is gratefully acknowledged.