Berlin 2014 – scientific programme

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P: Fachverband Plasmaphysik

P 21: Plasma Technology II

P 21.7: Talk

Thursday, March 20, 2014, 12:30–12:45, SPA HS201

Formation of metal and metal oxide nanoparticles generated in gas phase by pulsed DC sputtering in a reactive gas admixture — Oleksandr Polonskyi, Amir Mohammad Ahadi, Alexander Hinz, Egle Vasiliauskaite, •Thomas Strunskus, and Franz Faupel — Institute for Materials Science, Chair for Multicomponent Materials, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel, Germany

This work is focused on the formation of metal and metal oxide nanoparticles (Ag, TiOx, AlxOy, SiOx) in a gas aggregation source with continuous or pulsed DC magnetron sputtering. Usually argon was used as a working gas, but in case of reactive metals (Ti, Al) a low concentration of oxygen or nitrogen is necessary for the cluster formation process. It was also observed that a gas aggregation cluster source based on pulsed reactive DC magnetron sputtering gives rise to a huge increase in deposition rate of nanoparticles by more than one order of magnitude compared to continuous operation (e.g., TiOx nanoparticles) [1]. The influence of the sputtering parameters and reactive gas admixing on the nanoparticles formation process was investigated. The prepared nanoparticles were characterized with regard to chemical composition, morphology and optical properties.

[1] Polonskyi et al., Appl. Phys. Lett. 103, 033118 (2013)