Berlin 2014 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
Q: Fachverband Quantenoptik und Photonik
Q 61: Photonics II
Q 61.2: Vortrag
Freitag, 21. März 2014, 14:15–14:30, UDL HS3038
Direct laser writing of 3D nanostructures using a blue 405nm quasi-CW laser diode — •Patrick Müller1,3, Michael Thiel2,3, and Martin Wegener1,2,3 — 1Institute of Applied Physics and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany — 2Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe, Germany — 3Nanoscribe GmbH, 76344 Eggenstein-Leopoldshafen, Germany
Direct laser writing (DLW) is a well-known and established technology for manufacturing 3D micro- and nanoscale structures. Usually, red femtosecond laser sources with wavelengths of about 800nm are used for DLW. Here, using a blue 405nm quasi-CW laser diode as the exciting laser source the linear wavelength dependence of the Abbe resolution limit, a=λ /(2·NA), is exploited in order to improve structures in terms of decreasing feature size and line distance. A nonlinear multi-photon polymerization process is necessary for manufacturing true 3D structures. We have observed such nonlinearities in a resist system based on the monomer pentaerythritol triacrylate. To benefit from the improved theoretical resolution it is necessary to achieve a close to diffraction limited focal spot. A dip-in DLW writing scheme was realized by reducing the mismatch in refractive index between the objective lens and the photoresist. Woodpile photonic crystal structures as well as line gratings serve as benchmarks to prove the performance of the system and were analyzed with different experimental methods.