Berlin 2014 – scientific programme

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SYOT: Symposium Plasma und Optische Technologien

SYOT 3: SFB zu Plasma und Optische Technologien

SYOT 3.5: Invited Talk

Tuesday, March 18, 2014, 16:00–16:30, SPA Kapelle

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium oxide — •Adriana Szeghalmi, Stephan Ratzsch, and Ernst Bernhard Kley — Friedrich Schiller University Jena, Institute of Applied Physics, Jena, Germany

Anatase hillrocks form on the surface of thin TiO2 films in plasma enhanced atomic layer deposition (PEALD) processes. Their height, size and density depend on the applied oxygen pressure and plasma potential. The lower the oxygen gas flow the higher the numbers of randomly distributed nucleation sites which lead to the formation of the hillrocks. Their consequence is high surface roughness that increases the challenge of coating nanostructured substrates with a high aspect ratio. Additionally, such titania films for optical applications would suffer of optical losses due to stray light. To suppress the formation of crystalline hillrocks, we demonstrate a multilayer stack made of titanium oxide with ultrathin alumina interlayers. The alumina interlayers with a thickness of only 1 nm inhibit the formation of the hillrocks providing smooth films with excellent optical properties and surface morphology.