Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 17: Ion and Electron Beam Induced Processes
DS 17.8: Vortrag
Dienstag, 1. April 2014, 15:45–16:00, CHE 91
Comparison of proton and electron induced electronic excitations in thin metal films — •Lars Breuer1, Andreas Wucher1, and Detlef Diesing2 — 1Fakultät für Physik, Universität Duisburg-Essen, Duisburg, Germany — 2Fakultät für Chemie, Universität Duisburg-Essen, Essen, Germany
The electronic excitation in thin metal films by low energy protons and electrons (60 eV < E < 1000 eV) is detected as a current flowing from the ion or electron irradiated metal film through a thin oxide layer to an aluminium back electrode. Thus, the thin film metal–insulator–metal device couples the electronically excited metal (silver in the present work) to a metal (aluminium in the present work) in its electronic ground state. By the application of a bias voltage to the device in the course of ion irradiation a spectroscopy of the irradiation induced electronic excitation becomes possible. The device allows a characterisation of the excited electrons and of the excited holes as well in contrast to a conventional spectrometer with a retarding field. Proton induced excitations are found to store a significant amount of the energy in excited holes. Electron induced excitations on the other hand show only a negligible fraction of energy stored in holes, the main fraction of energy consists of secondary electrons in this type of excitations.