DS 17: Ion and Electron Beam Induced Processes
Dienstag, 1. April 2014, 14:00–16:15, CHE 91
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14:00 |
DS 17.1 |
Reverse Epitaxy — •Xin Ou, Adrian Keller, Manfred Helm, Jürgen Fassbender, and Stefan Facsko
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14:15 |
DS 17.2 |
Gallium Nitride Films by Ion-Beam Assisted MBE - Effects of Long-Term Ion Irradiation — •Annemarie Finzel, Jürgen Gerlach, Frank Frost, Jan Lorbeer, and Bernd Rauschenbach
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14:30 |
DS 17.3 |
Systematic investigations of low energy ion beam sputtering of Ge — •Rene Feder, Horst Neumann, Carsten Bundesmann, and Bernd Rauschenbach
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14:45 |
DS 17.4 |
Enhanced Sputtering Effects of Ion Irradiated Silicon Nanowires — •Stefan Noack, Andreas Johannes, Henry Holland-Moritz, Markus Glaser, Alois Lugstein, and Carsten Ronning
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15:00 |
DS 17.5 |
Investigation of dopant profiles, losses and heating using an energy filter for ion implantation — •Florian Krippendorf, Constantin Csato, Michael Rüb, Carsten Ronning, and Johannes von Borany
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15:15 |
DS 17.6 |
Novel porous liquid metal ion source for surface modification with heavy polyatomic ions — •Daniel Bock, Wolfgang Pilz, Martin Tajmar, and Lothar Bischoff
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15:30 |
DS 17.7 |
Charge exchange and energy loss of slow highly charged ions in 1nm thick carbon nanomembrane — •Richard A. Wilhelm, Elisabeth Gruber, Robert Ritter, René Heller, Stefan Facsko, and Friedrich Aumayr
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15:45 |
DS 17.8 |
Comparison of proton and electron induced electronic excitations in thin metal films — •Lars Breuer, Andreas Wucher, and Detlef Diesing
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16:00 |
DS 17.9 |
Formation of PbTe nano particle by low energy ion beam mixing of Te/Pb bilayer — •Srashti Gupta, Dinesh Agarwal, Saif Khan, Sonathi Neeleshwar, Sunil Ohja, Ambuj Tripathi, S Amirthapandian, Binaya Panigrahi, and Devesh Avasthi
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