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DS: Fachverband Dünne Schichten
DS 35: Poster I: Application of thin films; Focus session: Sensoric micro and nano-systems; Focus Session: Sustainable photovoltaics with earth abundant materials; Graphen (joint session with TT; MA; HL; DY; O); Ion and electron beam induced processes; Layer properties: electrical, optical, and mechanical properties; Magnetic/organic interfaces, spins in organics and molecular magnetism; Micro- and nanopatterning (jointly with O); Organic electronics and photovoltaics (jointly with CPP, HL, O); Thermoelectric materials
DS 35.1: Poster
Wednesday, April 2, 2014, 17:00–20:00, P1
Preparation and Characterization of oxide Heterostructures for future Applications in Information Technology — •Markus Waschk, Alexander Weber, Markus Schmitz, Paul Zakalek, and Thomas Brückel — Jülich Center for Neutron Science JCNS and Peter Grünberg Institut PGI: Streumethoden, Forschungszentrum Jülich GmbH, 52428 Jülich, Germany
Nowadays the increased demand on highly efficient storage devices leads to the development of new materials for future devices. Promising candidates are multifunctional oxides that open a wide field of physical properties due to their correlated electron system. Especially the interface of two oxide thin films can exhibit different properties as found in bulk. For instance, the combination of the antiferromagnetic materials LaMnO3 and SrMnO3 in a thin film system leads to an interface with ferromagnetic behavior.
We want to present two state of the art preparation methods, which is the oxide molecular beam epitaxy on the one hand and the high oxygen pressure sputtering system on the other hand. These techniques provide the possibility to grow stoichiometric oxide thin films very precisely.
We identify the structural parameters of the films by using x-ray scattering and atomic force microscopy. Furthermore a SQUID magnetometer and a MOKE setup are used to determine the magnetic parameters of the samples. We use polarized neutron scattering to gain informations about the magnetic depth profile of our samples.