Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 35: Poster I: Application of thin films; Focus session: Sensoric micro and nano-systems; Focus Session: Sustainable photovoltaics with earth abundant materials; Graphen (joint session with TT; MA; HL; DY; O); Ion and electron beam induced processes; Layer properties: electrical, optical, and mechanical properties; Magnetic/organic interfaces, spins in organics and molecular magnetism; Micro- and nanopatterning (jointly with O); Organic electronics and photovoltaics (jointly with CPP, HL, O); Thermoelectric materials
DS 35.36: Poster
Mittwoch, 2. April 2014, 17:00–20:00, P1
Determination of Fluorine dopants in Fused Silica by means of Nuclear Reaction Analysis (NRA) — •Emanuel Schmidt, Anne Nathanael, and Elke Wendler — Institut für Festkörperphysik Jena
Fluorine doped fused silica has plenty of applications, e.g. in modern optical systems or in the production of micro-electronic components. However the absolute determination of light elements, such as fluorine, in an substrate containing heavier atoms, such as fused silica, is a non-trivial task. Ion beam analysis provides therefore suitable methods, as they are independent of chemical processes and offers the possibility to measure absolute concentrations of light elements even for values smaller than 1ppm.
Therefore we used a proton-fluorine nuclear reaction (19F(p,α0)16O) to measure absolute concentrations of fluorine atoms in fused silica. We have characterized the excitation-function of the nuclear reaction 19F(p,α0)16O in our laboratory-system and could measure profiles of fluorine concentrations over sample depths and determine dopant concentrations within the SiO2 matrix.