Dresden 2014 – scientific programme
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DS: Fachverband Dünne Schichten
DS 35: Poster I: Application of thin films; Focus session: Sensoric micro and nano-systems; Focus Session: Sustainable photovoltaics with earth abundant materials; Graphen (joint session with TT; MA; HL; DY; O); Ion and electron beam induced processes; Layer properties: electrical, optical, and mechanical properties; Magnetic/organic interfaces, spins in organics and molecular magnetism; Micro- and nanopatterning (jointly with O); Organic electronics and photovoltaics (jointly with CPP, HL, O); Thermoelectric materials
DS 35.49: Poster
Wednesday, April 2, 2014, 17:00–20:00, P1
Rigorous simulations and analysis of the optical response of silica sculptured thin films — •Eike Lennart Fricke1, Christoph Grüner2, Carsten Bundesmann2, Rüdiger Schmidt-Grund1, and Marius Grundmann1 — 1Universität Leipzig, Inst. für Experimentelle Physik II, Linnéstr. 5, 04103 Leipzig, Germany — 2Leibniz-Institut für Oberflächenmodifizierung e.V, Permoserstr. 15, 04318 Leipzig, Germany
We present full Mueller-matrix spectra of columnar silica sculptured thin films prepared by electron beam glancing angle deposition on silicon substrates in a wide spectral range from 0.5 to 6.5 eV. We analyse the data in two ways: (i) using anisotropic effective medium theory and (ii) using rigorous simulations based on the Rigorous Coupled Wave Approach.
The analysis by means of anisotropic Bruggeman effective medium approximation reproduces the measured data only qualitatively . Especially in the UV spectral range, where the long wavelength assumption of the Bruggeman EMA does no longer hold, the deviation drastically increases. As an alternative we employ the two-dimensional Fourier-Modal-Method, also known as Rigorous Coupled Wave Approach. The model takes the geometric parameters of the columns namely the inter-columnar distance, the radius and the inclination angle of the columns as well as their dielectric function as input parameters, that are optimised using non-linear regression.
A comparison of both methods highlights their different limitations for the analysis of complex surfaces.