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DS: Fachverband Dünne Schichten
DS 35: Poster I: Application of thin films; Focus session: Sensoric micro and nano-systems; Focus Session: Sustainable photovoltaics with earth abundant materials; Graphen (joint session with TT; MA; HL; DY; O); Ion and electron beam induced processes; Layer properties: electrical, optical, and mechanical properties; Magnetic/organic interfaces, spins in organics and molecular magnetism; Micro- and nanopatterning (jointly with O); Organic electronics and photovoltaics (jointly with CPP, HL, O); Thermoelectric materials
DS 35.5: Poster
Wednesday, April 2, 2014, 17:00–20:00, P1
Assisted ion beam interface investigation for highly reflective Cr/Sc multilayer mirrors — •Alexander Guggenmos1,2, Stefan Radünz1,2, Roman Rauhut1,2, Bert Nickel3, Sriram Venkatesan4, Angela Wochnik4, Christina Scheu4, Eric M. Gullikson5, Ferenc Krausz1,2, and Ulf Kleineberg1,2 — 1LMU München, Fakultät für Physik, Garching, Germany — 2MPQ, Garching, Germany — 3CeNS, LMU München, München, Germany — 4LMU München, Fakultät für Chemie, München, Germany — 5CXRO, Lawrence Berkeley National Lab, Berkeley, USA
Extending single attosecond pulse technology from currently sub-200 eV to the water window spectral range may enable for the first time the unique investigation of ultrafast electronic processes within the core states of bio-molecules. The demand on highly reflective multilayer mirrors for spectral shaping or focusing attosecond pulses in the water window wavelength range, between the K-absorption edges of carbon and oxygen (2.3-4.4 nm), manifests itself due to the lack of sources with sufficient photon flux. Realizing this requisite utilizes interface optimized multilayer mirrors with almost perfect interfaces due to the huge loss in reflectivity which arises from boundary imperfections. We present our achievements in minimizing the interface roughness of ion-beam deposited Cr/Sc multilayer mirrors by optimizing the kinetic energy of the utilized Krypton ions both in the deposition and the interface polishing process. Experimental results from measurements using X-ray reflectometry, spectral ellipsometry and XUV reflectrometry as well as TEM cross section images are shown and discussed.