Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.14: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Hydration effects of chitosan on silicon. — •Marcelo Cisternas1, Maria J. Retamal1, Sebastan Gutierrez2, Mark Busch3, Patrick Huber3, Tomas Perez-Acle2, Ulrich Volkmann1, and Michael Kappl4 — 1P. Universidad Catolica de Chile, Santiago, Chile — 2Fundacion Ciencia y Vida, Santiago, Chile — 3Tech. Univ. Hamburg-Harburg, Hamburg, Germany — 4MPI for Polymer Research, Mainz, Germany
Chitosan (CH) is a polysaccharide obtained by the deacetylation of chitin, a component of the exoskeleton of crustaceans. Among its most important features we can mention that it is biocompatible, non-toxic and biodegradable. Therefore, it has been used both in the field of agriculture, as well as in medicine. Chitosan appears to be very interesting for biological applications, both as a macro-and micro-scale material. We are interested in CH deposited on a planar silicon substrate (with a native SiO2 surface) as a possible support for hydration of artificial biological membranes (phospholipids), which form the base for different biosensors. We prepare CH islands and layers of different thickness in a solvent free environment and control with high resolution ellipsometry the layer thickness during formation as well as before and after hydration. The film topography is studied with AFM at room temperature and during heating cycles. The CH-layer capability for water storing is tested with ellipsometry during heating cycles from room temperature to 370 K. We observed that CH does not wet the SiO2 surface when deposited from the gas phase. It forms spontaneously semi-spheres. This behavior favors the capability of the structure for water storage.