Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.21: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Sputter yield amplification of carbon by serial magnetron co-sputtering — •Patrick Ries1, Rüdiger Schmidt1, Andreas Pflug2, Tomas Kubart3, and Matthias Wuttig1,4 — 1I. Physikalisches Institut (IA), RWTH Aachen, Germany — 2Fraunhofer IST, Braunschweig, Germany — 3Solid State Electronics, Uppsala University, Sweden — 4JARA - Fundamentals of Future Information Technology
Carbon has been doped by serial co-sputtering with two different elements, namely Tungsten and Niobium. Both elements provide a significant rate increase for the doping concentrations analyzed. A dopant concentration of 3 at.% Nb increases the deposition rate of carbon by 130%, whereas W increases it by 280%. Due to its higher mass, W is significantly more effective than Nb. TRIDYN simulations have been performed which reproduce the experimental data and show that saturation occurs at higher dopant concentrations, which have not been reached in the experiments. Additionally our experiments indicate very long residual times of the dopant in the target as a result of recoil implantation.