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DS: Fachverband Dünne Schichten

DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)

DS 43.23: Poster

Donnerstag, 3. April 2014, 16:00–19:00, P1

Influence of film thickness on structural properties of TiO₂ films coated with RF and DC magnetron sputtering — •Sebastian Schipporeit¹, Sanat Kumar Mukherjee¹, Abdelkader Nebatti², Farhad Mohtascham¹, Christian Notthoff², and Dieter Mergel¹ — ¹Faculty of Physics, University Duisburg-Essen — ²Faculty of Engineering, University Duisburg-Essen

TiO₂ thin films were deposited by reactive sputtering of a Ti target on unheated substrates and post-heated at 300 ^∘C and 500 ^∘C. The dc-sputtered films are amorphous after deposition and crystallize to pure anatase only at 500 ^∘C. The rf-deposited films are crystalline (purely anatase) already after deposition without post-heating. Above a thickness of 100 nm, the crystallite size is constant at 35 nm and decreases to zero when the thickness decreases to 25 nm. Below 25 nm the films are x-ray amorphous. Height and half-width of the XRD peaks of rf-sputtered films do not change upon post-heating at 300 or 500 ^∘C, contrary to the intensitiy of Raman lines [1]. A larger lattice parameter ratio c/a is observed compared to the bulk value that decreases with increasing film thickness and is about 1 % larger for a film thickness larger than 100 nm.

[1] Sanat Kumar Mukherjee, Dieter Mergel, J. Appl. Phys. 114, 013501 (2013).