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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.23: Poster
Thursday, April 3, 2014, 16:00–19:00, P1
Influence of film thickness on structural properties of TiO2 films coated with RF and DC magnetron sputtering — •Sebastian Schipporeit1, Sanat Kumar Mukherjee1, Abdelkader Nebatti2, Farhad Mohtascham1, Christian Notthoff2, and Dieter Mergel1 — 1Faculty of Physics, University Duisburg-Essen — 2Faculty of Engineering, University Duisburg-Essen
TiO2 thin films were deposited by reactive sputtering of a Ti target on unheated substrates and post-heated at 300 ∘C and 500 ∘C. The dc-sputtered films are amorphous after deposition and crystallize to pure anatase only at 500 ∘C. The rf-deposited films are crystalline (purely anatase) already after deposition without post-heating. Above a thickness of 100 nm, the crystallite size is constant at 35 nm and decreases to zero when the thickness decreases to 25 nm. Below 25 nm the films are x-ray amorphous. Height and half-width of the XRD peaks of rf-sputtered films do not change upon post-heating at 300 or 500 ∘C, contrary to the intensitiy of Raman lines [1]. A larger lattice parameter ratio c/a is observed compared to the bulk value that decreases with increasing film thickness and is about 1 % larger for a film thickness larger than 100 nm.
[1] Sanat Kumar Mukherjee, Dieter Mergel, J. Appl. Phys. 114, 013501 (2013).