Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.24: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Pulsed Laser Deposition of thin Metal-Oxide Multilayers for thermal barrier coatings — •Anna Major1, Florian Döring1, Christian Eberl1, Sarah Hoffmann2, Felix Schlenkrich1, and Hans-Ulrich Krebs1 — 1Institute for Materials Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — 2Institute for X-Ray Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Multilayers consisting of metals and oxides are highly interesting for modern high-quality coatings especially with regard to their unique thermal conducting properties which could be used for thermal barrier coatings in different applications like gas turbine coatings, cryogenic applications or modern power plants.
Therefore, we have studied pulsed laser deposited (PLD at 248 nm) multilayers consisting of various metals (e.g. W, Ti, Cu) and oxides (e.g. ZrO2 or MgO) with different layer thicknesses. Their structure, interface roughness and thermal stability were characterized by X-Ray-Reflectivity, Scanning-Electron-Microscopy and cross-sectional Transmission-Electron-Microscopy. Especially we focus on the material combination of W and ZrO2, which is highly useful for high temperature applications due to its high thermal stability. For effective multilayer insulation it is necessary to produce very thin individual layers with a high interface density and therefore many scattering and reflection centers for heat transporting phonons.
In this contribution, we show our results in producing these multilayers with high quality and thin individual layer thicknesses.