Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.30: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Soft X-ray emission spectroscopy used for the characterization of a-C and CNx thin films — Sergej Nepijko1, Alisa Chernenkaya1, Katerina Medjanik1, •Sergey Chernov1, Michael Klimenkov2, Oleksandr Vlasenko3, Svetlana Petrovskaya4, Larisa Odnodvorets3, Yaroslav Zaulichnyy5, and Gerd Schönhense1 — 1Institute of Physics, University of Mainz, Germany — 2Institute for Applied Materials, Karlsruhe Institute of Technology, Germany — 3Sumy State University, Sumy, Ukraine — 4Frantsevich Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, Kiev, Ukraine — 5National Technical University of Ukraine (KPI), Kiev, Ukraine
We have studied a-C and CNx films characterized by an outstanding mechanical properties (hardness, elasticity, low friction coefficient) and chemical inertness thus being a good protection against corrosion and mechanical damage for underlying layers. We present the results of a soft X-ray emission spectroscopy study of a-C and CNx films on Si(100) and glass substrates. Also for the characterization of the homogeneity in depth electron energy loss spectroscopy measurements with localization better than 4 nm were carried out. In case of CNx films the highest diamond-like modification occurs in the region close to Si(100) substrate. Film density decreases with increasing distance from the substrate and becomes almost constant in range of thicknesses more than 2 nm. By means of X-ray absorption and photoelectron spectroscopies it was shown that a CNx film (a-C film also) as thin as 1.5 to 2 nm thickness effectively prevents oxidation of the underlying Co film.