 |
09:30 |
DS 49.1 |
Invited Talk:
Synthesis, Characterization, and Application of Tunable Resistance Coatings — •Jeffrey W. Elam
|
|
|
|
10:00 |
DS 49.2 |
ALD on Multi-Stacked Polystyrene Opals for Thermal Barrier Coatings — •Robert Zierold, Martin Waleczek, Josep M. Montero Moreno, Roman Kubrin, Hooi Sing Lee, Alexander Petrov, Manfred Eich, Gerold A. Schneider, and Kornelius Nielsch
|
|
|
|
10:15 |
DS 49.3 |
New opportunities with Plasma enhanced atomic layer deposition (PE-ALD) of oxides — •Massimo Tallarida, Karsten Henkel, Hassan Gargouri, Jörg Häberle, Bernd Gruska, Matthias Arens, and Dieter Schmeisser
|
|
|
|
10:30 |
DS 49.4 |
X-ray linear dichroism in atomic layer deposited Titanium dioxide layers — •Chittaranjan Das, Massimo Tallarida, and Dieter Schmeisser
|
|
|
|
10:45 |
DS 49.5 |
Control of thickness of SiO2 interfacial layer for photocatalytic water splitting on Si photocathodes — •Chittaranjan Das, Massimo Tallarida, and Dieter Schmeisser
|
|
|
| |
11:00 |
|
Coffee break (15 min)
|
|
|
|
11:15 |
DS 49.6 |
Atomic layer deposition of SrxTi1−xOy: Stoichiometry variation and layer characterization — •Solveig Rentrop, Barbara Abendroth, Hartmut Stöcker, Ralph Strohmeyer, Jura Rensberg, Juliane Walter, and Dirk C. Meyer
|
|
|
|
11:30 |
DS 49.7 |
Ta2O5 by thermal-activated ALD — •Marcel Junige, Ralf Tanner, Christian Wenger, Grzegorz Lupina, Matthias Albert, and Johann W. Bartha
|
|
|
|
11:45 |
DS 49.8 |
Simulation of the deposition and growth of nano-crystalline MgF2 films via the low-temperature atom beam deposition method — Sridhar Neelamraju, •Johann Christian Schön, and Martin Jansen
|
|
|
|
12:00 |
DS 49.9 |
Structural changes in HfO2 thin films: thickness and doping dependence — •Simone Brizzi, Massimo Tallarida, Christoph Adelmann, Lars-Ake Ragnasson, Sven Van Elshocht, and Dieter Schmeisser
|
|
|
|
12:15 |
DS 49.10 |
Charging effect in HfO2 films deposited on SiO2/Si by atomic layer deposition — •Silma Alberton Correa, Simone Brizzi, Massimo Tallarida, and Dieter Schmeisser
|
|
|
