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DS: Fachverband Dünne Schichten
DS 6: Thin Film Characterization: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS,...)
DS 6.18: Talk
Monday, March 31, 2014, 19:45–20:00, CHE 89
Resonant X-ray reflectometry study of YBa2Cu3O7−δ thin films: An atomic approach to reflectivity — •Jorge E. Hamann-Borrero1, Sven Partzsch1, Benjamin Gray2, Sebastian Macke3, Enrico Schierle4, Martin Zwiebler1, John W. Freeland5, Jak Chakhalian2, Bernd Buechner1, and Jochen Geck1 — 1IFW-Dresden — 2Department of Physics University of Arkansas, USA — 3Max Planck-UBC Centre for Quantum Materials, Vancouver, Canada — 4Helmholtz-Zentrum Berlin für Materialien und Energie — 5Advanced Photon Source, Argonne National Laboratory, Illinois, USA
We present a Cu L2,3 Resonant X-ray Reflectometry study of a (001)-YBCO thin film grown on SrTiO3. The reflectivities measured using σ and π polarized light show a strong dichroism due to the local anisotropy of the different copper sites at the plane and chain layers of this compound. Within the scanned q-range also the (001) Bragg reflection appears highlighting the importance of the interference between the different scattering centers in the sample.
In order to describe the observed intensities, traditional models such as the Parrat’s formalism fail, since they neglect the interference between the atomic scatterers. Therefore, we employed a new atomistic approach to model reflectivity where the most important structural, finite size, surface and interface effects, are considered by explicitly defining the atom positions together with their anisotropic scattering form factors. First calculations will be presented and discussed.