Dresden 2014 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 6: Thin Film Characterization: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS,...)

DS 6.8: Vortrag

Montag, 31. März 2014, 17:00–17:15, CHE 89

Chemical composition of Mo-based layers deposited by spray pyrolysis — Marlis Ortel, •Torsten Balster, and Veit Wagner — Research Center for Functional Materials and Nanomolecular Science, Jacobs University Bremen, Campus Ring 1, 28759 Bremen, Germany

Mechanical and liquid exfoliation are well known techniques to produce nano flakes for high performance transition metal dichalcogenide (TMD) thin film transistors (TFTs). However, up to now there is a lack of deposition processes for large area processing.

In this work, the focus is on spray pyrolysis which is a suitable deposition technology for large area thin film growth. Understanding of decomposition processes during growth is essential to deposite high quality thin films. The chemical composition in the deposited layer results from those decomposition processes and can be monitored by X-ray photoelectron spectroscopy (XPS). The investigated MoS₂ thin films were deposited from non-toxic precursor solutions, e. g. ammonium tetrathiomolybdate (ATTM) dissolved in dimethyl sulfoxide (DMSO). The chemical composition of the thin films was analyzed with respect to the decomposition temperature of the precursor and whether Mo and S can be provided from a single source. Generally, it was found that Mo-based thin films deposited far above the decomposition temperature (e.g. at 360^∘C) require an additional sulfur source to successfully grow MoS₂.