Dresden 2014 – scientific programme
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HL: Fachverband Halbleiterphysik
HL 107: Poster: Emerging oxide semiconductors / Oxides other than ZnO and its relatives
HL 107.3: Poster
Thursday, April 3, 2014, 17:00–20:00, P1
TEM investigation of structural changes in epitaxial (In,Sn)2O3 and (Sn,In)O2 films — •Stephan Scholz1, Anna Mogilatenko1,2, Holm Kirmse1, Oliver Bierwagen3,4, Mark E. White4, Min-Ying Tsai4, Martin Schmidbauer5, James S. Speck4, and Saskia F. Fischer1 — 1Humboldt-Universität zu Berlin, 10099 Berlin, Germany — 2Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik, 12489 Berlin, Germany — 3Paul-Drude-Institut für Festkörperelektronik, 10117 Berlin, Germany — 4University of California, Santa Barbara, CA 93106, USA — 5Leibniz-Institut für Kristallzüchtung, 12489 Berlin, Germany
Transparent conducting oxides in In2O3-SnO2 pseudo-binary system are used in many optoelectronic applications, e.g. solar cells, flatscreens and touchscreens. In single-crystalline In2O3 and SnO2 films, the conductivity extrema with regard to the In:Sn ratio are accompanied by crystal structure degradation [1][2]. Thus, analysis of growth-induced defects and possible structural changes in thin oxide films is important for understanding the electrical properties of these materials.
We have applied transmission electron microscopy to characterize structural changes and compositional homogeneity in epitaxial (In,Sn)2O3 as well as (Sn,In)O2 films grown by plasma-assisted molecular beam epitaxy. The obtained information contributes to the understanding of the mechanisms that lead to conductivity saturation in indium-tin-oxides. [1] O. Bierwagen and J. Speck, Phys. Status Solidi A. doi:10.1002/pssa.201330224 (2013). [2] M. White, O. Bierwagen, M. Tsai, and J. Speck, APEX 3, 051101 (2010)