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Dresden 2014 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 114: Oxides: Bulk, films and interfaces

Freitag, 4. April 2014, 09:30–12:45, POT 251

09:30 HL 114.1 Structural and Electronic Properties of Si/ZnO Interfaces from ab-initio Quasiparticle Calculations — •Benjamin Höffling and Friedhelm Bechstedt
  09:45 HL 114.2 The contribution has been withdrawn.
10:00 HL 114.3 Diameter-dependent Absorption Edges of One-dimensional TiO2 Nanotube Arrays by Atomic Layer Deposition — •Ahmed Al-Haddad, Samar Tarish, Ranjith Vellacheri, Wenxin Wang, Fabian Grote, Zhibing Zhan, and Yong Lei
10:15 HL 114.4 Heteroepitaxial ZnO films on diamondFabian Schuster, •Martin Hetzl, Cesar Magén, Jordi Arbiol, Jose Garrido und Martin Stutzmann
10:30 HL 114.5 A comprehensive study on ion-implantation induced defects in ZnO thin films — •Florian Schmidt, Stefan Müller, Holger von Wenckstern, Robert Röder, Sebastian Geburt, Carsten Ronning, and Marius Grundmann
10:45 HL 114.6 Influence of deposition parameters on p-NiO/n-ZnO heterojunctions — •Paul Räcke, Robert Karsthof, Holger von Wenckstern, and Marius Grundmann
  11:00 Coffee break (15 min.)
11:15 HL 114.7 Formation of stable bound magnetic polarons in depleted ZnCoO films — •T. Kaspar, D. Bürger, I. Skorupa, O.G. Schmidt, and H. Schmidt
11:30 HL 114.8 Structure dependent magnetic properties of Co implanted TiO2 — •Oguz Yildirim, Steffen Cornelius, Maik Butterling, Wolfgang Amwand, Andreas Wagner, Alevtina Smekhova, and Kay Potzger
  11:45 HL 114.9 The contribution has been withdrawn.
12:00 HL 114.10 Recharging behaviour of nitrogen-centers in ZnO — •Jan M. Philipps, Bruno K. Meyer, Detlev M. Hofmann, and Matt McCluskey
12:15 HL 114.11 Highly rectifying contacts on amorphous zinc-tin-oxide thin films consisting of metals and p-type zinc-cobalt-oxide — •Peter Schlupp, Friedrich-Leonhard Schein, Holger von Wenckstern, and Marius Grundmann
12:30 HL 114.12 Transparent photovoltaics: ZnO/NiO heterojunctions working as UV solar cells — •Robert Karsthof, Paul Räcke, Zhipeng Zhang, Holger von Wenckstern, and Marius Grundmann
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