Dresden 2014 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
HL: Fachverband Halbleiterphysik
HL 85: Organic light emission
HL 85.4: Vortrag
Donnerstag, 3. April 2014, 10:15–10:30, POT 006
Photolithographic structuring of organic electroluminescent devices with state-of-the-art efficiency — •Simonas Krotkus1, Fabian Ventsch1, Daniel Kasemann1, Alexander A. Zakhidov2, Simone Hofmann1, Karl Leo1, and Malte C. Gather1,3 — 1Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-Straße 1, 01069 Dresden, Germany — 2Fraunhofer Research Institution for Organics, Materials & Electronic Devices COMEDD, 01109 Dresden, Germany — 3School of Physics & Astronomy, University of St Andrews, North Haugh, St Andrews, KY16 9SS, Scotland, UK
Photolithography is a well-established patterning technique used in various applications, including color filter structuring for LCD displays. However, its use in pixel patterning for organic light-emitting diode (OLED) screens to date is rather limited, due to the use of organic or water-based solvents, etchants and photoresists, which are known to be detrimental to the OLEDs. Thus, structuring via shadow mask is used instead, which has its limitations in the high resolution patterning as well as the scalability to the large area substrates.
To address the incompatibility between organic semiconductors and the processing steps of the conventional photolithography, we utilize a double resist approach. It consists of a fluoropolymer as a lift-off layer in combination with a traditional photoresist/solvent process to allow pattern transfer. The lift-off step is performed in hydrofluoroether solvents, which are shown to be compatible with state-of-the-art OLED technology.