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MA: Fachverband Magnetismus

MA 19: Poster I

MA 19.37: Poster

Dienstag, 1. April 2014, 13:00–15:30, P1

Controlled pinning of magnetic Fe and Pt pillars created by electron beam induced deposition — Johannes J.L. Mulders and •Daniela Sudfeld — FEI Electron Optics B. V., Eindhoven, The Netherlands

Electron beam induced deposition is a direct write patterning technique, using the electron beam of a scanning electron microscope (SEM) to locally dissociate injected precursor molecules adhered to a surface. The details of the FEI EBID technique are described elsewhere [1]. The lateral patterning is done with nano-scale accuracy and the vertical growth is controlled by the dwell time, the technique offers a mask-free patterning capability in 3 dimensions. Recently the material quality of the actual deposition of magnetic materials such as Co, Fe and Pt, has reached a purity level above 70 at%, enabling the creation of prototype nano-scale magnetic structures [2] like for instance Fe Pillars on a predefined PtCoPt circuit path. The current status of the technology for creating ferro-magnetic structures will be presented, including the practical limits. In addition, results of the controlled pinning and the modulation of domain wall pinning sites are presented. [1] Utke I, Moshkalev S, Russell P: Nanofabrication Using Focused Ion and Electron Beams, Chapter 10, Oxford University Press (2012); [2] Lavrijsen R et al, Nanotechnology 22 (2011) 025302.