Dresden 2014 – scientific programme
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MA: Fachverband Magnetismus
MA 19: Poster I
MA 19.7: Poster
Tuesday, April 1, 2014, 13:00–15:30, P1
Recent Advances of Metalorganic Aerosol Deposition — •Markus Jungbauer1, Sebastian Hühn1, Markus Michelmann1, Felix Massel1, Victor Pfahl1, Camillo Ballani1, Danny Schwarzbach1, Ricardo Egoavil2, Jo Verbeeck2, and Vasily Moshnyaga1 — 1I. Physikalisches Institut, Georg-August-Universität, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — 2Electron Microscopy for Materials Science (EMAT) , Groenenborglaan 171, 2020 Antwerp, Belgium
Metalorganic Aerosol Deposition (MAD) is a chemical-solution-based technique developed to grow oxide thin films at vacuum-free conditions. It has already been established that high quality films of different materials, like manganites, cobaltites, titanates, ruthenates, cuprates, ZnO, can be deposited by MAD. The recently installed in-situ ellipsometry enables to monitor important growth parameters (substrate temperature, film thickness) as well as to characterize the growth mode. Moreover, a valuable information on the electronic intermixing at the interfaces and roughening during the growth can be obtained. This is especially useful for MAD atomic layer epitaxy (ALE), which we applied to grow perovskites ABO3 by alternating deposition of AO and BO2 layers. A "layer-by-layer" (A-O/B-O2) growth of manganite films was achieved as well as the valence change of the Mn-ions during the growth was detected. The reduction of oxygen partial pressure allowed us to access new materials, like the high TC double perovskites and magnetite (Fe3O4), which are unstable under ambient conditions. Financial support from EU FP 7, IFOX project is acknowledged.