Dresden 2014 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 28: Magnetic Materials I
MA 28.10: Vortrag
Mittwoch, 2. April 2014, 17:30–17:45, HSZ 04
Formation of nanostructured NiFe alloy thin films by glancing incidence sputter deposition on nano-rippled Si substrates: an in-situ uGISAXS study — •Sarathlal Koyiloth Vayalil1, Ajay Gupta2, Gonzalo Santoro1, Peng Zhang1, Shun Yu1, and Stephan V Roth1 — 1Photon Science, Deutsches Elektronen-Synchrotron, Notkestrasse-85, Hamburg, Germany, 22607 — 2UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore, India, 452001.
In this work, growth of potentially important soft magnetic thin films of NiFe alloy on nano-rippled Si substrates at two different deposition geometries (i) normal incidence (ii) glancing angle deposition have been described. The results have been compared with the deposition on pristine Si substrates. Grazing incidence small angle measurements coupled with highly sophisticated sputtering chamber enabled a detailed growth study at nanoscale with time resolution in the order of milliseconds[1]. It has been found that, growth is highly anisotropic along and normal to the ripple wave vectors in both the cases. The annealing followed by the deposition generates large range ordered nanowires of NiFe. Further, ex-situ magnetic measurements have been done using magneto-optical Kerr effect by rotating the sample in azimuthal direction. The mechanism of the observed magnetic anisotropy has been explained by correlating with the GISAXS results.
[1]Dörhmann et al. Rev. Sci. Instrum. 84, 043901 (2013)