Dresden 2014 – scientific programme
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MA: Fachverband Magnetismus
MA 38: Magnetic Materials II
MA 38.7: Talk
Thursday, April 3, 2014, 11:15–11:30, HSZ 403
Influence of the film thickness on the martensitic transition in free-standing Ni-Mn-Sn thin films — •Svetlana Klimova1,2, Niclas Teichert2, Lars Helmich2, Andreas Hütten2, Anna Behler3, Anja Waske3,4, and Walid Hetaba2,5 — 1Saratov State University, Department of Nano- and biomedical Technology, 410012 Saratov, Russia — 2Bielefeld University, Department of Physics, Thin Films and Physics of Nanostructures, 33615 Bielefeld, Germany — 3IFW Dresden, Institute for Complex Materials, 01069 Dresden, Germany — 4TU Dresden, Institut für Festkörperphysik, 01062 Dresden, Germany — 5TU Wien, Universitäre Service-Einrichtung für Transmissionselektronenmikroskopie (USTEM), 1040 Wien, Austria
Magnetic materials based on Ni-Mn-Sn are Heusler alloys, in which a structural transition carries out from the low temperature martensitic to the high temperature austenitic phase. In this study we have synthesized the free-standing Ni-Mn-Sn thin films between 20 nm and 200 nm and transferred onto different substrates (Si or GaAs wafers, cupper grids or glass) to investigate the influence of the film thickness on the martensitic transition. The films were epitaxially grown on MgO (001) substrates with a sacrificial V layer by DC magnetron co-sputtering at a substrate temperature of 500°C. This allows to study the substrate influence on the martensitic transition. The applied methods to study the martensitic transition include temperature dependent resistivity and magnetization measurements, X-Ray Diffraction, and Transmission Electron Microscopy.