Dresden 2014 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
MA: Fachverband Magnetismus
MA 55: Poster II
MA 55.55: Poster
Freitag, 4. April 2014, 10:30–13:30, P2
Behavior of MnSi thin films under hydrostatic pressure — •Josefin Engelke1, Dirk Menzel1, Hiroyuki Hidaka2, Taisei Seguchi2, and Hiroshi Amitsuka2 — 1IPKM, TU Braunschweig, Mendelssohnstr. 3, 38106 Braunschweig, Germany — 2Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan
Recently, thin films of the B20 compound MnSi became subject of great interest, since the magnetic properties of bulk MnSi can be modified by inducing uniaxial anisotropy. In comparison to the bulk the critical fields are enhanced and the skyrmion phase is found to be enlarged within the magnetic phase diagram [1],[2]. Furthermore the ordering temperature of 43 K is considerably higher than in bulk (Tord,bulk = 29 K).
Under applied hydrostatic pressure the ordering temperature of bulk MnSi decreases with increasing pressure, and a non-Fermi liquid behavior for pressures exceeding 12 kbar occurs. At 14.6 kbar the magnetic order is completely suppressed [3].
We present resistivity measurements on MnSi thin films under applied pressure of up to around 40 kbar. Qualitatively, the behavior is similar to bulk MnSi. However, the critical pressure is considerably enhanced. Non-Fermi liquid behavior evidenced by a T3/2 behavior of the resitivity is observed, when the pressure reaches 33 kbar.
[1] J. Engelke et al., J. Phys. Soc. Japn. 81, 124709 (2012). [2] M. N. Wilson et al., Phys. Rev. B 86, 144420 (2012). [3] C. Pfleiderer et al., Phys. Rev. B 55, 8331 (1997).