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MA: Fachverband Magnetismus
MA 55: Poster II
MA 55.78: Poster
Freitag, 4. April 2014, 10:30–13:30, P2
In-situ Polarised Neutron Reflectometry during Thin Film Growth by DC Magnetron Sputtering — •S. Mayr1, W. Kreuzpaintner1, B. Wiedemann1, A. Schmehl2, T. Mairoser2, A. Herrnberger2, J.-F. Moulin3, J. Stahn4, P. Korelis4, M. Haese-Seiller3, M. Pomm3, A. Paul1, P. Böni1, and J. Mannhart5 — 1Technische Universität München — 2Universität Augsburg — 3Helmholtz Zentrum Geesthacht — 4Paul Scherrer Institut Villigen — 5Max Planck Institut Stuttgart
Since thin magnetic layers are used in many magneto-electronic devices the understanding of their texture and the coupling between them is essential to improve functionality. As these parameters are likely to change during the deposition process, in-situ polarised neutron reflectometry (PNR) is used to monitor the development of the structural and magnetic properties of thin films while they are grown. We routinely carry out in-situ PNR measurements using either the horizontal Time-of-Flight reflectometers REFSANS at FRM II or AMOR at PSI with a specially designed sputtering chamber as sample environment combined with modern neutron optical elements. In this contribution, the epitaxial growth of Fe and Cr on a Cu(100)/Si(100) substrate and the observed onset and evolution of the magnetic properties as a function of film thickness will be presented. Initially, after each monolayer deposition step, the reflectivity of polarised neutrons was measured during a short period of time. After approximately 100 Å, the deposition process was adapted and Fe/Cr-bilayers were grown to investigate the evolution of exchange coupling effects in a Fe/Cr heterostructure.