Dresden 2014 – wissenschaftliches Programm
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MI: Fachverband Mikrosonden
MI 5: Ion Beam Methods
MI 5.1: Vortrag
Mittwoch, 2. April 2014, 09:30–10:00, MER 02
Materials Analysis with Electron Beam Ion Sources — J. König1, L. Bischoff3, U. Kentsch2, M. Kreller1, W. Pilz3, E. Ritter1, M. Schmidt1, A. Silze1, and •G. Zschornack2 — 1DREEBIT GmbH, Dresden, Germany — 2Technische Universität Dresden, Dresden, Germany — 3Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany
Electron beam ion sources (EBIS) are able to create a spectrum from low to highly charged ions from gaseous, liquid, or solid primary materials. The high density electron beam in an ultra-high vacuum environment inside of these sources ionizes the material under very well controllable operation parameters. Thus, an ion beam with a sharp energy distribution to be set between some 100 eV and several 10 keV is formed. This allows for a precise analysis of the material components with a relative sensitivity for abundances down to 10−4 and a relative mass resolution on the order of 10−3, accurate enough to distinguish between isotopes or molecular ions with small mass differences. In this presentation, we give an overview of materials analysis techniques using easy-to-handle tabletop-sized electron beam ion sources of the Dresden EBIS type. Mass spectrometry measurements with ion sources in combination with bending magnets or ExB filters for mass-to-charge ratio analysis are presented. Furthermore, in comparison to analysis methods where sample material is introduced directly into the source, results from secondary ion mass spectrometry with standard as well as focused ion beam (FIB) EBIS setups are shown. Finally, applications for the presented methods will be discussed.