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MI: Fachverband Mikrosonden

MI 5: Ion Beam Methods

MI 5.2: Vortrag

Mittwoch, 2. April 2014, 10:00–10:30, MER 02

Helium and Neon Ion Microscopy. Extending the frontiers of nanotechnology — •Peter Gnauck, Lars-Oliver Kautschor, and Mohan Ananth — Carl Zeiss Microscopy, Oberkochen, Germany

The Helium Ion Microscope has been described as an impact technology offering new insights into the structure and function of nanomaterials. Combining a high brightness Gas Field Ion Source (GFIS) with unique sample interaction dynamics, the helium ion microscope provides images offering unique contrast and complementary information to existing charged particle imaging instruments such as the SEM and TEM. Formed by a single atom at the emitter tip, the helium probe can be focused to below 0.25nm offering the highest recorded resolution for secondary electron images. The small interaction volume between the helium beam and the sample also results in images with stunning surface detail . Besides imaging, the helium ion beam can be used for fabricating nanostructures at the sub-10nm length scale. The helium ion beam has been used for deposition and etching in conjunction with appropriate chemistries. Helium induced deposition results in higher quality deposits than with Ga-FIB or EBID (Electron Beam Induced Deposition). Finally, the helium ion beam can be used for direct sputtering of different materials. Patterning of graphene has resulted in 5nm wide nanoribbons and 3.5nm holes in silicon nitride membranes have been demonstrated. This work has culminated in the development of an ion microscope with a gas field ion source that can operate with both He and Ne.