MI 5: Ion Beam Methods
Mittwoch, 2. April 2014, 09:30–10:45, MER 02
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09:30 |
MI 5.1 |
Materials Analysis with Electron Beam Ion Sources — J. König, L. Bischoff, U. Kentsch, M. Kreller, W. Pilz, E. Ritter, M. Schmidt, A. Silze, and •G. Zschornack
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10:00 |
MI 5.2 |
Helium and Neon Ion Microscopy. Extending the frontiers of nanotechnology — •Peter Gnauck, Lars-Oliver Kautschor, and Mohan Ananth
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10:30 |
MI 5.3 |
Depth Profiling of OLED Materials by Cluster Ion Beams. — •Andrey Lyapin, John S. Hammond, Sankar N. Raman, Scott R. Bryan, Nicholas C. Erickson, and Russell J. Holmes
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