Dresden 2014 – scientific programme

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MI: Fachverband Mikrosonden

MI 6: X-ray Imaging, Holography and Tomography

MI 6.4: Talk

Wednesday, April 2, 2014, 11:45–12:00, MER 02

High Throughput Fabrication of Fresnel Zone Plates via Ion Beam Lithography — •Kahraman Keskinbora, Corinne Grévent, Umut Tunca Sanli, Ulrike Eigenthaler, and Gisela Schütz — Max Planck Institute for Intelligent Systems, 70569, Stuttgart, Germany

Fabrication of high resolution Fresnel Zone Plates (FZPs) by means of e-beam Lithography (EBL) have contributed to the establishment of the X-ray microscopy. However, EBL is an intricate and costly technique. Here, alternatively, we demonstrate the rapid fabrication of FZPs via direct write ion beam lithography (IBL) with resolutions approaching those of commercially available EBL-FZPs. Fabrication of 50 µ m wide FZP with 50 and 30 nm outermost zone widths were completed in less than 13 and 9 minutes, respectively. Utilizing these IBL-FZBs as the focusing optics in a soft X-ray microscope, it was possible to clearly resolve features of 28 down to 21 nm size with respective cut-off half-pitch resolutions of 24.5 and 21 nm. We believe this rapid fabrication technique will have positive impact on the development of laboratory based soft X-ray microscopy and in applications where large arrays of FZPs are required, such as zone plate array lithography or disposable FZPs for FEL applications.