Dresden 2014 – scientific programme

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MM: Fachverband Metall- und Materialphysik

MM 28: Nanomaterials I - Synthesis of advanced nanostructures

MM 28.2: Talk

Tuesday, April 1, 2014, 12:15–12:30, IFW A

Micro and nano-scale magnetic structures created by electron beam induced deposition — Johannes J.L. Mulders and •Daniela Sudfeld — FEI Electron Optics B. V., Eindhoven, The Netherlands

Electron beam induced deposition is a direct write patterning technique, using the electron beam of a scanning electron microscope (SEM) to locally dissociate injected precursor molecules adhered to a surface[1]. This dissociation results in a split of the precursor molecule into a volatile part (such as Fe) and a non-volatile part (such as CO), that is pumped out. The non-volatile part forms a deposit at the location of the electron beam and because the lateral patterning is done with nano-scale accuracy and the vertical growth is controlled by the dwell time, the technique offers a direct write patterning capability in 3 dimensions. Recently the material quality of the actual deposition of magnetic materials such as Co and Fe, has reached a level allowing for the creation of nano-scale magnetic structures that can be used for domain wall pinning, Hall sensors, and tips for magnetic force microscopy (MFM). The current status of the technology will be presented, including the practical limits and recent examples. In addition results using Co and Fe precursors, as well as a brief outlook into the near future will be presented. [1] Botman A., Mulders JJL, Hagen CW, Nanotechnology 20 (2009) 372001