Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

O: Fachverband Oberflächenphysik

O 37: Posters: Plasmonics, Electronic Structure and Spin-Orbit Interaction, Semiconductor and Insulator Surfaces, Nanostructures

O 37.108: Poster

Dienstag, 1. April 2014, 18:30–22:00, P2

Simulation of ballistic glancing angle deposition — •Christoph Grüner, Stefan G. Mayr, and Bernd Rauschenbach — Leibniz Institute of Surface Modification, Leipzig, Germany

Computer simulations can be a powerful tool to investigate physical vapor deposition processes. While molecular dynamics simulations can provide information about short range effects, long range effects have to be treated with different simulation techniques. Glancing angle deposition (GLAD) is based on the long range self-shadowing, which appears when a vapor beam reaches a substrate at a highly oblique condition [1]. This leads to the growth of a highly porous thin film, composed of many free-standing nanostructures. For a realistic modeling of this shadowing effect very large numbers of particles and large cell dimensions are required. Handling this large number of particles is very computationally intensive, so that on-lattice simulations are a common tool. However, this ballistic growth process is highly sensitive to the geometrical correctness of the simulation. Tanto et al. [2] have shown, that a simple approach, using cubic particles on a cubic lattice, introduces significant errors to the results of such simulations. A deeper investigation of these effects and a discussion of their impact on the modeling of the GLAD process are presented. Further a 'work-around' is proposed, that nearly eliminates the presented effects while it not increases the computation time to much.

[1] J.M. Nieuwenhuizen, H.B. Haanstra, Philips Tech. Rev. 27 87 (1966).

[2] B. Tanto, C. F. Doiron, T.-M. Lu, Phys. Rev. E 83, 016703 (2011).