Dresden 2014 – scientific programme

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O: Fachverband Oberflächenphysik

O 37: Posters: Plasmonics, Electronic Structure and Spin-Orbit Interaction, Semiconductor and Insulator Surfaces, Nanostructures

O 37.109: Poster

Tuesday, April 1, 2014, 18:30–22:00, P2

A comparison of evaporation and sputter glancing angle deposition — •Xubin Lu, Christoph Grüner, Jens Bauer, and Bernd Rauschenbach — Leibniz Institute of Surface Modification, Leipzig, Germany

It is well known, that different physical vapor deposition techniques lead to different micro structures of the deposited thin films. Particle energy and angular distribution during the process are the main factors influencing the growth behavior. While these parameters and their effects are well investigated for normal incidence deposition, the situation is much more unclear for oblique and glancing angle deposition (GLAD). Here the substrates normal and the incoming particle beam form a nearly right angle. This results in the growth of separated nanostructures, that form a porous thin film [1]. This process is mainly based on a self-shadowing effect between neighboring nucleation sites and later nanostructures. This self-shadowing during the growth is influenced by the divergence of the particle beam, while the shape of the individual nanostructures is sensitive to surface diffusion effects. A comparison of electron beam evaporation and sputter GLAD is shown, investigating growth speed and porosity of the film as well as size and tilt angle of the individual nanostructures.

[1] J.M. Nieuwenhuizen, H.B. Haanstra, Philips Tech. Rev. 27 87 (1966).