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O: Fachverband Oberflächenphysik

O 61: Nanostructures at Surfaces III

O 61.3: Vortrag

Mittwoch, 2. April 2014, 16:30–16:45, WIL B321

Metal and metal oxide nanoparticles generated in gas phase by pulsed DC sputtering in a reactive gas admixture — •Oleksandr Polonskyi, Amir Mohammad Ahadi, Alexander Hinz, Egle Vasiliauskaite, Thomas Strunskus, and Franz Faupel — Institute for Materials Science, Chair for Multicomponent Materials, CAU at Kiel, Kaiserstr. 2, 24143 Kiel, Germany

Metal nanoparticles have been of high scientific interest in the last decades due to their unique chemical, physical, mechanical, electrical, magnetic and optical properties. Gas aggregation cluster sources (GAS) based on the magnetron sputtering (Haberland concept) are widely utilized for fabrication of various metal nanoparticles. This work is focused on deposition of metal and metal oxide nanoparticles (Ag, TiOx, AlxOy, SiOx) by means of GAS with continuous or pulsed DC magnetron sputtering. Usually argon was used as a working gas, but in case of reactive metals (Ti, Al) a low concentration of oxygen or nitrogen was admixed, which is necessary for the cluster formation process. It was also observed that a gas aggregation cluster source based on pulsed reactive DC magnetron sputtering gives rise to a huge increase in deposition rate of nanoparticles by more than one order of magnitude compared to continuous operation (e.g., TiOx nanoparticles) [1]. The influence of the sputtering parameters and reactive gas admixing on the nanoparticles formation process was investigated. The prepared nanoparticles were characterized with regard to chemical composition, morphology and optical properties.

[1] Polonskyi et al., Appl. Phys. Lett. 103, 033118 (2013)